Au nanopatterns on glass substrate using block copolymer and their applications in transparent conducting electrode
Identifieur interne : 002010 ( Main/Repository ); précédent : 002009; suivant : 002011Au nanopatterns on glass substrate using block copolymer and their applications in transparent conducting electrode
Auteurs : RBID : Pascal:12-0291105Descripteurs français
- Pascal (Inist)
- Formation motif, Formation nanomotif, Copolymère séquencé, Densité élevée, Nanostructure, Matériau électrode, Transparence, Conductivité électrique, Polymère, Verre spin, Dépôt centrifugation, Film polymère, Effet rayonnement, Irradiation UV, Or, Styrène polymère, Méthacrylate de méthyle polymère, Toluène, Oxyde d'étain, Rayonnement UV, Acide acétique, Couche mince métallique, Couche mince, Epaisseur couche, Evaporation, Pulvérisation irradiation, Acétone, Facteur transmission, Oxyde d'indium, Microscopie électronique balayage, Substrat or, Substrat verre, 8116R, 8107, 7361, 6180.
- Wicri :
English descriptors
- KwdEn :
- Acetic acid, Acetone, Block copolymer, Electrical conductivity, Electrode material, Evaporation, Gold, High density, Indium oxide, Layer thickness, Metallic thin films, Nanopatterning, Nanostructures, PMMA, Patterning, Polymer films, Polymers, Polystyrene, Radiation effects, Scanning electron microscopy, Spin glasses, Spin-on coating, Sputtering, Thin films, Tin oxide, Toluene, Transmittance, Transparency, Ultraviolet irradiation, Ultraviolet radiation.
Abstract
High density Au nanostructures were fabricated using polystyrene-block-polymethylmethacrylate (PS-b-PMMA) copolymer on glass substrate for the preparation of electrode materials with good stability, high transparency and excellent conductivity. A 1 wt.% polymer solution in toluene was spin coated on glass substrate. Samples were baked for 48 h at 200 °C with a continuous flow of Ar. Patterned polymer film was obtained by removing the PMMA region through exposing ultraviolet irradiation and rinsing in acetic acid. Au thin films with several thicknesses were then deposited onto the patterned glass substrates by thermal evaporation or sputtering. Removing PS cylinders by sonicating in acetone resulted in Au nanopattern on glass substrates. The connecting gold film acts as conductor while the holes allow light pass through it and helps to be transparent. The transmittance with Au film thickness of 7 nm and 4 nm was found to be about 63% and 70%, respectively. The resistivity was in the range 10-5 Ω cm-10-6 Ω cm which is comparable with ITO (10-3 Ω cm-10-4 Ω cm).
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<record><TEI><teiHeader><fileDesc><titleStmt><title xml:lang="en" level="a">Au nanopatterns on glass substrate using block copolymer and their applications in transparent conducting electrode</title><author><name sortKey="Mahbub Alam, Md" uniqKey="Mahbub Alam M">Md. Mahbub Alam</name><affiliation wicri:level="1"><inist:fA14 i1="01"><s1>Department of Arts and Sciences, Ahsanullah University of Science and Technology, 141-142 Love Road</s1><s2>Tejgaon, Dhaka-1208</s2><s3>BGD</s3><sZ>1 aut.</sZ></inist:fA14><country>Bangladesh</country><wicri:noRegion>Tejgaon, Dhaka-1208</wicri:noRegion></affiliation></author><author><name sortKey="Kim, Jin Yeol" uniqKey="Kim J">Jin-Yeol Kim</name><affiliation wicri:level="1"><inist:fA14 i1="02"><s1>Department of Advanced Materials Engineering, Graduate School of Kookmin University, 861-1 Jeongneung-dong</s1><s2>Seongbuk-gu, Seoul, 136-702</s2><s3>KOR</s3><sZ>2 aut.</sZ><sZ>3 aut.</sZ></inist:fA14><country>Corée du Sud</country><wicri:noRegion>Seongbuk-gu, Seoul, 136-702</wicri:noRegion></affiliation></author><author><name sortKey="Jung, Woo Gwang" uniqKey="Jung W">Woo-Gwang Jung</name><affiliation wicri:level="1"><inist:fA14 i1="02"><s1>Department of Advanced Materials Engineering, Graduate School of Kookmin University, 861-1 Jeongneung-dong</s1><s2>Seongbuk-gu, Seoul, 136-702</s2><s3>KOR</s3><sZ>2 aut.</sZ><sZ>3 aut.</sZ></inist:fA14><country>Corée du Sud</country><wicri:noRegion>Seongbuk-gu, Seoul, 136-702</wicri:noRegion></affiliation></author></titleStmt><publicationStmt><idno type="inist">12-0291105</idno><date when="2012">2012</date><idno type="stanalyst">PASCAL 12-0291105 INIST</idno><idno type="RBID">Pascal:12-0291105</idno><idno type="wicri:Area/Main/Corpus">001B52</idno><idno type="wicri:Area/Main/Repository">002010</idno></publicationStmt><seriesStmt><idno type="ISSN">0040-6090</idno><title level="j" type="abbreviated">Thin solid films</title><title level="j" type="main">Thin solid films</title></seriesStmt></fileDesc><profileDesc><textClass><keywords scheme="KwdEn" xml:lang="en"><term>Acetic acid</term><term>Acetone</term><term>Block copolymer</term><term>Electrical conductivity</term><term>Electrode material</term><term>Evaporation</term><term>Gold</term><term>High density</term><term>Indium oxide</term><term>Layer thickness</term><term>Metallic thin films</term><term>Nanopatterning</term><term>Nanostructures</term><term>PMMA</term><term>Patterning</term><term>Polymer films</term><term>Polymers</term><term>Polystyrene</term><term>Radiation effects</term><term>Scanning electron microscopy</term><term>Spin glasses</term><term>Spin-on coating</term><term>Sputtering</term><term>Thin films</term><term>Tin oxide</term><term>Toluene</term><term>Transmittance</term><term>Transparency</term><term>Ultraviolet irradiation</term><term>Ultraviolet radiation</term></keywords><keywords scheme="Pascal" xml:lang="fr"><term>Formation motif</term><term>Formation nanomotif</term><term>Copolymère séquencé</term><term>Densité élevée</term><term>Nanostructure</term><term>Matériau électrode</term><term>Transparence</term><term>Conductivité électrique</term><term>Polymère</term><term>Verre spin</term><term>Dépôt centrifugation</term><term>Film polymère</term><term>Effet rayonnement</term><term>Irradiation UV</term><term>Or</term><term>Styrène polymère</term><term>Méthacrylate de méthyle polymère</term><term>Toluène</term><term>Oxyde d'étain</term><term>Rayonnement UV</term><term>Acide acétique</term><term>Couche mince métallique</term><term>Couche mince</term><term>Epaisseur couche</term><term>Evaporation</term><term>Pulvérisation irradiation</term><term>Acétone</term><term>Facteur transmission</term><term>Oxyde d'indium</term><term>Microscopie électronique balayage</term><term>Substrat or</term><term>Substrat verre</term><term>8116R</term><term>8107</term><term>7361</term><term>6180</term></keywords><keywords scheme="Wicri" type="concept" xml:lang="fr"><term>Polymère</term><term>Or</term></keywords></textClass></profileDesc></teiHeader><front><div type="abstract" xml:lang="en">High density Au nanostructures were fabricated using polystyrene-block-polymethylmethacrylate (PS-b-PMMA) copolymer on glass substrate for the preparation of electrode materials with good stability, high transparency and excellent conductivity. A 1 wt.% polymer solution in toluene was spin coated on glass substrate. Samples were baked for 48 h at 200 °C with a continuous flow of Ar. Patterned polymer film was obtained by removing the PMMA region through exposing ultraviolet irradiation and rinsing in acetic acid. Au thin films with several thicknesses were then deposited onto the patterned glass substrates by thermal evaporation or sputtering. Removing PS cylinders by sonicating in acetone resulted in Au nanopattern on glass substrates. The connecting gold film acts as conductor while the holes allow light pass through it and helps to be transparent. The transmittance with Au film thickness of 7 nm and 4 nm was found to be about 63% and 70%, respectively. The resistivity was in the range 10<sup>-5</sup> Ω cm-10<sup>-6</sup> Ω cm which is comparable with ITO (10<sup>-3</sup> Ω cm-10<sup>-4</sup> Ω cm).</div></front></TEI><inist><standard h6="B"><pA><fA01 i1="01" i2="1"><s0>0040-6090</s0></fA01><fA02 i1="01"><s0>THSFAP</s0></fA02><fA03 i2="1"><s0>Thin solid films</s0></fA03><fA05><s2>520</s2></fA05><fA06><s2>16</s2></fA06><fA08 i1="01" i2="1" l="ENG"><s1>Au nanopatterns on glass substrate using block copolymer and their applications in transparent conducting electrode</s1></fA08><fA11 i1="01" i2="1"><s1>MAHBUB ALAM (Md.)</s1></fA11><fA11 i1="02" i2="1"><s1>KIM (Jin-Yeol)</s1></fA11><fA11 i1="03" i2="1"><s1>JUNG (Woo-Gwang)</s1></fA11><fA14 i1="01"><s1>Department of Arts and Sciences, Ahsanullah University of Science and Technology, 141-142 Love Road</s1><s2>Tejgaon, Dhaka-1208</s2><s3>BGD</s3><sZ>1 aut.</sZ></fA14><fA14 i1="02"><s1>Department of Advanced Materials Engineering, Graduate School of Kookmin University, 861-1 Jeongneung-dong</s1><s2>Seongbuk-gu, Seoul, 136-702</s2><s3>KOR</s3><sZ>2 aut.</sZ><sZ>3 aut.</sZ></fA14><fA20><s1>5161-5164</s1></fA20><fA21><s1>2012</s1></fA21><fA23 i1="01"><s0>ENG</s0></fA23><fA43 i1="01"><s1>INIST</s1><s2>13597</s2><s5>354000507794050090</s5></fA43><fA44><s0>0000</s0><s1>© 2012 INIST-CNRS. All rights reserved.</s1></fA44><fA45><s0>27 ref.</s0></fA45><fA47 i1="01" i2="1"><s0>12-0291105</s0></fA47><fA60><s1>P</s1></fA60><fA61><s0>A</s0></fA61><fA64 i1="01" i2="1"><s0>Thin solid films</s0></fA64><fA66 i1="01"><s0>NLD</s0></fA66><fC01 i1="01" l="ENG"><s0>High density Au nanostructures were fabricated using polystyrene-block-polymethylmethacrylate (PS-b-PMMA) copolymer on glass substrate for the preparation of electrode materials with good stability, high transparency and excellent conductivity. A 1 wt.% polymer solution in toluene was spin coated on glass substrate. Samples were baked for 48 h at 200 °C with a continuous flow of Ar. Patterned polymer film was obtained by removing the PMMA region through exposing ultraviolet irradiation and rinsing in acetic acid. Au thin films with several thicknesses were then deposited onto the patterned glass substrates by thermal evaporation or sputtering. Removing PS cylinders by sonicating in acetone resulted in Au nanopattern on glass substrates. The connecting gold film acts as conductor while the holes allow light pass through it and helps to be transparent. The transmittance with Au film thickness of 7 nm and 4 nm was found to be about 63% and 70%, respectively. The resistivity was in the range 10<sup>-5</sup> Ω cm-10<sup>-6</sup> Ω cm which is comparable with ITO (10<sup>-3</sup> Ω cm-10<sup>-4</sup> Ω cm).</s0></fC01><fC02 i1="01" i2="3"><s0>001B80A16R</s0></fC02><fC02 i1="02" i2="3"><s0>001B80A07Z</s0></fC02><fC02 i1="03" i2="3"><s0>001B70C61</s0></fC02><fC02 i1="04" i2="3"><s0>001B60A80</s0></fC02><fC03 i1="01" i2="3" l="FRE"><s0>Formation motif</s0><s5>01</s5></fC03><fC03 i1="01" i2="3" l="ENG"><s0>Patterning</s0><s5>01</s5></fC03><fC03 i1="02" i2="X" l="FRE"><s0>Formation nanomotif</s0><s5>02</s5></fC03><fC03 i1="02" i2="X" l="ENG"><s0>Nanopatterning</s0><s5>02</s5></fC03><fC03 i1="02" i2="X" l="SPA"><s0>Formacíon nanomotivo</s0><s5>02</s5></fC03><fC03 i1="03" i2="X" l="FRE"><s0>Copolymère séquencé</s0><s2>NK</s2><s5>03</s5></fC03><fC03 i1="03" i2="X" l="ENG"><s0>Block copolymer</s0><s2>NK</s2><s5>03</s5></fC03><fC03 i1="03" i2="X" l="SPA"><s0>Copolímero secuencia</s0><s2>NK</s2><s5>03</s5></fC03><fC03 i1="04" i2="X" l="FRE"><s0>Densité 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